Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00177016%3A_____%2F23%3AN0000072" target="_blank" >RIV/00177016:_____/23:N0000072 - isvavai.cz</a>

Alternative codes found

RIV/00216224:14310/23:00130104

Result on the web

<a href="https://www.sciencedirect.com/science/article/pii/S0042207X22007564" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0042207X22007564</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2022.111634" target="_blank" >10.1016/j.vacuum.2022.111634</a>

Result language

angličtina

Original language name

Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures

Original language description

Capacitively coupled RF glow discharge was used to form novel coatings of SiOxCyHz using varying proportions of trimethylsilyl acetate (TMSAc) monomer and the carrier gas argon. The properties of the TMSAc-based plasma polymers produced depend significantly on the proportion of argon in TMSAc/Ar gaseous mixture, which ranged from 0 % to 75 %. Reaction mixtures containing less than 50 % Ar produced hydrophobic polymers, for which the indentation hardness values were less than 1.5 GPa. Seventy-five percent argon in the reaction mixture yielded a crosslinked carbon-rich organosilicon structure with a hardness of 6 GPa. As many applications require good stability in a liquid environment, the TMSAc-based coatings were immersed in phosphate buffered saline (PBS) for 14 days. Because any material used in a medical application must be resistant to the techniques used for sterilization, the prepared coatings were subjected to a standard sterilization procedure using UVC radiation. A degree of the structural changes induced by both environments corresponded to the argon ratio used for production of thin films. Possible degradation mechanisms were examined and discussed. Using 7.7–21.4 % Ar during the deposition process led to the TMSAc-based plasma polymers exhibiting good resistance to the prolonged immersion in PBS and UVC sterilization.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2023

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Vacuum

ISSN

0042-207X

e-ISSN

1879-2715

Volume of the periodical

207

Issue of the periodical within the volume

January 2023

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

12

Pages from-to

111634

UT code for WoS article

000890335800005

EID of the result in the Scopus database

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