Size and Spatial, Homogeneity of SiGe Quantum Dots in Amorphous Silica Matrix (Article No. 084319)
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F09%3A00206976" target="_blank" >RIV/00216208:11320/09:00206976 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Size and Spatial, Homogeneity of SiGe Quantum Dots in Amorphous Silica Matrix (Article No. 084319)
Original language description
Size and spatial homogeneity of semiconductor quantum dots in amorphous matrix was studied by x-ray small-angle scattering and x-ray diffraction
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Applied Physics
ISSN
0021-8979
e-ISSN
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Volume of the periodical
106
Issue of the periodical within the volume
8
Country of publishing house
US - UNITED STATES
Number of pages
6
Pages from-to
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UT code for WoS article
000271358100094
EID of the result in the Scopus database
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