Characterization of U-based thin films: the UFe(2+x) case

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F11%3A10105892" target="_blank" >RIV/00216208:11320/11:10105892 - isvavai.cz</a>
Result on the web
<a href="http://iopscience.iop.org/1742-6596/303/1/012012" target="_blank" >http://iopscience.iop.org/1742-6596/303/1/012012</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1742-6596/303/1/012012" target="_blank" >10.1088/1742-6596/303/1/012012</a>

Result language
angličtina
Original language name
Characterization of U-based thin films: the UFe(2+x) case
Original language description
We have characterized UFe2+x films prepared by sputter deposition onto fused silica (SiO2) and Si(111) substrates with the film thickness ranging from 75 nm to 900 nm. The Xray diffraction results showed an amorphous character of the deposited material.Some of the films showed in addition a pattern of highly textured cubic Laves phase. Rutherford Backscattering Spectroscopy with 2 MeV He+ ions has been used to determine the composition, thickness and concentration depth profile of the films. A large ageing affect was observed within 1 month after that the films were exposed to air. Magnetic measurements revealed TC increasing with relative Fe concentration and reaching approx. 450 K in UFe3.0.
Czech name
—
Czech description
—

Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
—

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Similar results(10)