Computational study of sheath structure in chemically active plasmas

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F11%3A10106256" target="_blank" >RIV/00216208:11320/11:10106256 - isvavai.cz</a>
Alternative codes found
RIV/44555601:13440/11:43878473
Result on the web
<a href="http://dx.doi.org/10.1051/epjap/2011110164" target="_blank" >http://dx.doi.org/10.1051/epjap/2011110164</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1051/epjap/2011110164" target="_blank" >10.1051/epjap/2011110164</a>

Result language
angličtina
Original language name
Computational study of sheath structure in chemically active plasmas
Original language description
Results of computer simulations describing an interaction between a low-temperature multicomponent plasma and an immersed metal substrate are presented. For this purpose, computer model of volume processes in a DC glow discharge in Ar-O2 mixture and a particle model of plasma-solid interaction were created. The interaction is studied not only in case when a constant value of voltage bias on the immersed substrate is kept, but also when sinusoidal voltage bias is applied. A pressure dependence of the sheath region in electronegative plasma is shown, too.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
—

Project
<a href="/en/project/GAP205%2F10%2F0979" target="_blank" >GAP205/10/0979: Study of the interaction of chemically active plasmas with solid surfaces at medium and higher pressures</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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