Low-pressure water vapour plasma treatment of surfaces for biomolecules decontamination

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F12%3A10124310" target="_blank" >RIV/00216208:11320/12:10124310 - isvavai.cz</a>

Result on the web

<a href="http://iopscience.iop.org/0022-3727/45/13/135203/pdf/0022-3727_45_13_135203.pdf" target="_blank" >http://iopscience.iop.org/0022-3727/45/13/135203/pdf/0022-3727_45_13_135203.pdf</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0022-3727/45/13/135203" target="_blank" >10.1088/0022-3727/45/13/135203</a>

Result language

angličtina

Original language name

Low-pressure water vapour plasma treatment of surfaces for biomolecules decontamination

Original language description

Decontamination treatments of surfaces are performed on bacterial spores, albumin and brain homogenate used as models of biological contaminations in a low-pressure, inductively coupled plasma reactor operated with water-vapour-based gas mixtures. It isshown that removal of contamination can be achieved using pure H2O or Ar/H2O mixtures at low temperatures with removal rates comparable to oxygen-based mixtures. Particle fluxes (Ar+ ions, O and H atomic radicals and OH molecular radicals) from water vapour discharge are measured by optical emission spectroscopy and Langmuir probe under several operating conditions. Analysis of particle fluxes and removal rates measurements illustrates the role of ion bombardment associated with O radicals, governing the removal rates of organic matter. Auxiliary role of hydroxyl radicals is discussed on the basis of experimental data. The advantages of a water vapour plasma process are discussed for practical applications in medical devices decontamina

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

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Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2012

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Physics D - Applied Physics

ISSN

0022-3727

e-ISSN

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Volume of the periodical

45

Issue of the periodical within the volume

13

Country of publishing house

GB - UNITED KINGDOM

Number of pages

9

Pages from-to

1-9

UT code for WoS article

000301880300008

EID of the result in the Scopus database

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