Nylon-sputtered nanoparticles: fabrication and basic properties

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F12%3A10126221" target="_blank" >RIV/00216208:11320/12:10126221 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1088/0022-3727/45/49/495301" target="_blank" >http://dx.doi.org/10.1088/0022-3727/45/49/495301</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/0022-3727/45/49/495301" target="_blank" >10.1088/0022-3727/45/49/495301</a>

Result language
angličtina
Original language name
Nylon-sputtered nanoparticles: fabrication and basic properties
Original language description
Nylon-sputtered nanoparticles were prepared using a simple gas aggregation cluster source based on a planar magnetron (Haberland type) and equipped with a nylon target. Plasma polymer particles originated in an aggregation chamber and travelled to a main(deposition) chamber with a gas flow through an orifice. The deposited nanoparticles were observed to have a cauliflower-like structure. The nanoparticles were found to be nitrogen-rich with N/C ratio close to 0.5. An increase in rf power from 60 to 100W resulted in a decrease in mean particle size from 210 to 168 nm whereas an increase in their residence time in the cluster source from 0.7 to 4.6 s resulted in an increase in the size from 73 to 231 nm.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Project
<a href="/en/project/LD11032" target="_blank" >LD11032: Nanocomposite, nanostructured films and plasma modification for improved PNFP</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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