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Nanostructured plasma polymers

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F13%3A10285427" target="_blank" >RIV/00216208:11320/13:10285427 - isvavai.cz</a>

  • Result on the web

    <a href="http://www.sciencedirect.com/science/article/pii/S0040609013014326#" target="_blank" >http://www.sciencedirect.com/science/article/pii/S0040609013014326#</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.tsf.2013.09.003" target="_blank" >10.1016/j.tsf.2013.09.003</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Nanostructured plasma polymers

  • Original language description

    Research into nanostructured thin films of plasma polymers is driven by applications of these materials in a wide variety of fields. Here, we review work on the preparation of such coatings using low-pressure discharges, with a focus on the different strategies employed. We start with nanostructured plasma polymers prepared by plasma polymerization under special conditions such as at a large distance from the plasma zone and at a high working gas pressure. Then, methods based upon plasma etching and colloidal lithography combined with plasma treatment are described. Finally, dusty plasmas and gas aggregation cluster sources with planar magnetrons are considered for generation of nanoclusters, nanoparticles, and for deposition of nanostructured plasma polymer films.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GA13-09853S" target="_blank" >GA13-09853S: Application of low temperature plasma in a gas aggregation cluster source for deposition of nanoparticles, nanostructured and nanocomposite films</a><br>

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2013

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Thin Solid Films

  • ISSN

    0040-6090

  • e-ISSN

  • Volume of the periodical

    548

  • Issue of the periodical within the volume

    December

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    17

  • Pages from-to

    1-17

  • UT code for WoS article

    000327530300001

  • EID of the result in the Scopus database