Deposition and characterization of Pt nanocluster films by means of gas aggregation cluster source
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F14%3A10285403" target="_blank" >RIV/00216208:11320/14:10285403 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.tsf.2014.09.064" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2014.09.064</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.tsf.2014.09.064" target="_blank" >10.1016/j.tsf.2014.09.064</a>
Alternative languages
Result language
angličtina
Original language name
Deposition and characterization of Pt nanocluster films by means of gas aggregation cluster source
Original language description
In this study we report on the deposition of Pt nanocluster films prepared by gas aggregation source that was operated with argon as working gas. The aim of this study was optimization of deposition process as well as determination of properties of deposited nanocluster films and their temporal stability. It was found that the production of Pt nanoclusters reached maximum value for pressure of 100 Pa and increases monotonously with magnetron current. The deposition rate at optimized deposition conditions was 0.7 nm of the Pt nanocluster film per second. Deposited films were porous and composed of 4 nm Pt nanoclusters. The nanoclusters were metallic and no sights of their oxidation were observed after 1 year on open air as witnessed by X-ray photoelectron spectroscopy. Regarding the electrical properties, a dramatic decrease of the resistivity was observed with increasing amount of deposited nanoclusters. This decrease saturated for the films approximately 50 nm thick. Such behavior ind
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA13-09853S" target="_blank" >GA13-09853S: Application of low temperature plasma in a gas aggregation cluster source for deposition of nanoparticles, nanostructured and nanocomposite films</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Thin Solid Films
ISSN
0040-6090
e-ISSN
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Volume of the periodical
571
Issue of the periodical within the volume
November
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
5
Pages from-to
13-17
UT code for WoS article
000346053900003
EID of the result in the Scopus database
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