Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F14%3A10285415" target="_blank" >RIV/00216208:11320/14:10285415 - isvavai.cz</a>

Alternative codes found

RIV/68378271:_____/14:00432642 RIV/61388955:_____/14:00432642

Result on the web

<a href="http://dx.doi.org/10.1088/0022-3727/47/40/405205" target="_blank" >http://dx.doi.org/10.1088/0022-3727/47/40/405205</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0022-3727/47/40/405205" target="_blank" >10.1088/0022-3727/47/40/405205</a>

Result language

angličtina

Original language name

Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser

Original language description

Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine theelectron temperature and the electron density, providing values of 1-3 eV and similar to 10(13)-10(14)m(-3), respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelengthlasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GAP108%2F11%2F1312" target="_blank" >GAP108/11/1312: Fabrication of thin films of UV-Vis-NIR transparent dielectrics by repetitive, capillary-discharge XUV laser ablation</a><br>

Continuities

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2014

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Physics D - Applied Physics

ISSN

0022-3727

e-ISSN

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Volume of the periodical

47

Issue of the periodical within the volume

40

Country of publishing house

GB - UNITED KINGDOM

Number of pages

6

Pages from-to

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UT code for WoS article

000341784800012

EID of the result in the Scopus database

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