Ablation of single-crystalline cesium iodide by extreme ultraviolet capillary-discharge laser
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F20%3A00538104" target="_blank" >RIV/61388955:_____/20:00538104 - isvavai.cz</a>
Alternative codes found
RIV/68378271:_____/20:00535114 RIV/61389021:_____/20:00541066 RIV/00216208:11320/20:10420452 RIV/61989100:27200/20:10246242
Result on the web
<a href="http://hdl.handle.net/11104/0315918" target="_blank" >http://hdl.handle.net/11104/0315918</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.2478/nuka-2020-0031" target="_blank" >10.2478/nuka-2020-0031</a>
Alternative languages
Result language
angličtina
Original language name
Ablation of single-crystalline cesium iodide by extreme ultraviolet capillary-discharge laser
Original language description
Extreme ultraviolet (XUV) capillary-discharge lasers (CDLs) are a suitable source for the efficient, clean ablation of ionic crystals, which are obviously difficult to ablate with conventional, long-wavelength lasers. In the present study, a single crystal of cesium iodide (CsI) was irradiated by multiple, focused 1.5-ns pulses of 46.9-nm radiation delivered from a compact XUV-CDL device operated at either 2-Hz or 3-Hz repetition rates. The ablation rates were determined from the depth of the craters produced by the accumulation of laser pulses. Langmuir probes were used to diagnose the plasma plume produced by the focused XUV-CDL beam. Both the electron density and electron temperature were sufficiently high to confirm that ablation was the key process in the observed CsI removal. Moreover, a CsI thin film on MgO substrate was prepared by XUV pulsed laser deposition. A fraction of the film was detected by X-ray photoelectron spectroscopy.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10403 - Physical chemistry
Result continuities
Project
<a href="/en/project/GA19-00579S" target="_blank" >GA19-00579S: Advanced diagnostics of reactive HiPIMS plasma for deposition of oxide, nitride and sulfide layers</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2020
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Nukleonika
ISSN
0029-5922
e-ISSN
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Volume of the periodical
65
Issue of the periodical within the volume
4
Country of publishing house
PL - POLAND
Number of pages
6
Pages from-to
205-210
UT code for WoS article
000582490100001
EID of the result in the Scopus database
2-s2.0-85096049178