Material properties of lithium fluoride for predicting XUV laser ablation rate and threshold fluence

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319540" target="_blank" >RIV/00216208:11320/15:10319540 - isvavai.cz</a>

Alternative codes found

RIV/61989100:27200/15:86095690 RIV/61989100:27230/15:86095690 RIV/61989100:27650/15:86095690 RIV/61989100:27740/15:86095690 and 2 more

Result on the web

<a href="http://dx.doi.org/10.1117/12.2178437" target="_blank" >http://dx.doi.org/10.1117/12.2178437</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1117/12.2178437" target="_blank" >10.1117/12.2178437</a>

Result language

angličtina

Original language name

Material properties of lithium fluoride for predicting XUV laser ablation rate and threshold fluence

Original language description

This paper deals with prediction of extreme ultraviolet (XUV) laser ablation of lithium fluoride at nanosecond timescales. Material properties of lithium fluoride were determined based on bibliographic survey. These data are necessary for theoretical estimation of surface removal rate in relevance to XUV laser desorption/ablation process. Parameters of XUV radiation pulses generated by the Prague capillary-discharge laser (CDL) desktop system were assumed in this context. Prediction of ablation curve and threshold laser fluence for lithium fluoride was performed employing XUV-ABLATOR code. Quasi-random sampling approach was used for evaluating its predictive capabilities in the means of variance and stability of model outputs in expected range of uncertainties. These results were compared to experimental data observed previously.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

JJ - Other materials

OECD FORD branch

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Project

<a href="/en/project/GAP108%2F11%2F1312" target="_blank" >GAP108/11/1312: Fabrication of thin films of UV-Vis-NIR transparent dielectrics by repetitive, capillary-discharge XUV laser ablation</a><br>

Continuities

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

DAMAGE TO VUV, EUV, AND X-RAY OPTICS V

ISBN

978-1-62841-632-9

ISSN

0277-786X

e-ISSN

—

Number of pages

9

Pages from-to

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Publisher name

SPIE-INT SOC OPTICAL ENGINEERING

Place of publication

BELLINGHAM

Event location

Prague, Czech Republic

Event date

Apr 15, 2015

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

000356917700005