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Ablation Threshold of XUV Laser Ablation of LiF

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F12%3A10133159" target="_blank" >RIV/00216208:11320/12:10133159 - isvavai.cz</a>

  • Result on the web

    <a href="http://www.mff.cuni.cz/veda/konference/wds/proc/pdf12/WDS12_209_f2_Pira.pdf" target="_blank" >http://www.mff.cuni.cz/veda/konference/wds/proc/pdf12/WDS12_209_f2_Pira.pdf</a>

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Ablation Threshold of XUV Laser Ablation of LiF

  • Original language description

    The first Atomic Force Microscopy (AFM) results are presented, obtained on the surface of a typical ionic crystal, i.e., lithium fluoride, exposed to focused nanosecond pulses delivered from a new source of Extreme Ultraviolet (XUV; laser wavelength: 46.9 nm) laser radiation. The desktop capillary-discharge XUV laser works in pulsed regime. Our studies of the interaction of the XUV laser radiation with LiF is motivated by potential utilization of the laser for Pulsed Laser Deposition (PLD). Exposed samples have been investigated not only by AFM but also with an optical profiler (White Light Interferometry-WLI) for a comparison of both the techniques.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GAP108%2F11%2F1312" target="_blank" >GAP108/11/1312: Fabrication of thin films of UV-Vis-NIR transparent dielectrics by repetitive, capillary-discharge XUV laser ablation</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2012

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    WDS'12 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media

  • ISBN

    978-80-7378-225-2

  • ISSN

  • e-ISSN

  • Number of pages

    4

  • Pages from-to

    54-57

  • Publisher name

    Matfyzpress

  • Place of publication

    Praha

  • Event location

    Praha

  • Event date

    May 29, 2012

  • Type of event by nationality

    EUR - Evropská akce

  • UT code for WoS article