The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F14%3A10289725" target="_blank" >RIV/00216208:11320/14:10289725 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1002/sia.5503" target="_blank" >http://dx.doi.org/10.1002/sia.5503</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/sia.5503" target="_blank" >10.1002/sia.5503</a>
Alternative languages
Result language
angličtina
Original language name
The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films
Original language description
Cerium oxide doped by a noble metal has been researched intensively for its high catalytic activity. In the presented study, Rh-Ce-O and CeOx thin films were deposited onto SiO2 and Cu substrates by radio-frequency magnetron sputtering. Thermal stabilityof the films was investigated by photoelectron spectroscopy techniques. Our results show that the substrate has a great influence on the stability of the overlayers. Rh-Ce-O deposited on Cu decomposes into rhodium and cerium oxide separate phases above600 K. In contrary, the Rh-Ce-O film on SiO2 remains stable up to 800 K, but silicon migrates from the substrate into the film, forming cerium silicate. We suggest that a strong interaction between SiO2 substrate and Rh-Ce-O, or CeOx films, could be responsible for higher thermal stability compared to films deposited onto Cu.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface and Interface Analysis
ISSN
0142-2421
e-ISSN
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Volume of the periodical
46
Issue of the periodical within the volume
10-11
Country of publishing house
GB - UNITED KINGDOM
Number of pages
4
Pages from-to
980-983
UT code for WoS article
000344987400068
EID of the result in the Scopus database
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