Altering properties of cerium oxide thin films by Rh doping

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319437" target="_blank" >RIV/00216208:11320/15:10319437 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1016/j.materresbull.2015.02.059" target="_blank" >http://dx.doi.org/10.1016/j.materresbull.2015.02.059</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.materresbull.2015.02.059" target="_blank" >10.1016/j.materresbull.2015.02.059</a>

Result language

angličtina

Original language name

Altering properties of cerium oxide thin films by Rh doping

Original language description

Ceria containing highly dispersed ions of rhodium is a promising material for catalytic applications. The Rh-CeOx thin films with different concentrations of rhodium were deposited by RF magnetron sputtering and were studied by soft and hard X-ray photoelectron spectroscopies, Temperature programmed reaction and X-ray powder diffraction techniques. The sputtered films consist of rhodium-cerium mixed oxide where cerium exhibits a mixed valency of Ce4+ and Ce3+ and rhodium occurs in two oxidation states,Rh3+ and Rhn+. We show that the concentration of rhodium has a great influence on the chemical composition, structure and reducibility of the Rh-CeOx thin films. The films with low concentrations of rhodium are polycrystalline, while the films with higher amount of Rh dopants are amorphous. The morphology of the films strongly influences the mobility of oxygen in the material. Therefore, varying the concentration of rhodium in Rh-CeOx thin films leads to preparing materials with differen

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/GA13-10396S" target="_blank" >GA13-10396S: New materials for planar fuel cells</a><br>

Continuities

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Materials Research Bulletin

ISSN

0025-5408

e-ISSN

—

Volume of the periodical

67

Issue of the periodical within the volume

Jul

Country of publishing house

US - UNITED STATES

Number of pages

9

Pages from-to

5-13

UT code for WoS article

000353852000002

EID of the result in the Scopus database

2-s2.0-84923862977