Study of mass and cluster flux in a pulsed gas system with enhanced nanoparticle aggregation

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F14%3A10293526" target="_blank" >RIV/00216208:11320/14:10293526 - isvavai.cz</a>

Alternative codes found

RIV/68378271:_____/14:00439292 RIV/60076658:12310/14:43887738

Result on the web

<a href="http://dx.doi.org/10.1063/1.4897234" target="_blank" >http://dx.doi.org/10.1063/1.4897234</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.4897234" target="_blank" >10.1063/1.4897234</a>

Result language

angličtina

Original language name

Study of mass and cluster flux in a pulsed gas system with enhanced nanoparticle aggregation

Original language description

The paper is focused on investigation of enhanced metal (Cu) cluster growth in a source of Haberland's type using pulsed gas aggregation. The aggregation Ar gas was delivered into the cluster source in a pulse regime, which results in the formation of well pronounced aggregation pressure peaks. The pressure peaks were varied by varying the different pulse gas frequency at the same mean pressure kept for all experiments. Hence, we were able to study the effect of enhanced aggregation pressure on clusterformation. Time-resolved measurements of cluster mass distribution were performed to estimate the mass and particle flux. The paper demonstrates that pulse gas aggregation influences growth of Cu nanoparticles, i.e., cluster mass/size, mass flux, and particle flux emitted from the cluster source. It was found that cluster mass related quantities are strongly influenced by pulsed gas frequency; the highest value of mass flux appears at the most pronounced pressure peaks. On the other hand

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GAP108%2F12%2F2104" target="_blank" >GAP108/12/2104: Advanced semiconductor materials for photoelectrochemical water splitting</a><br>

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2014

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

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Volume of the periodical

116

Issue of the periodical within the volume

14

Country of publishing house

US - UNITED STATES

Number of pages

7

Pages from-to

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UT code for WoS article

000343988000006

EID of the result in the Scopus database

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