Stress release during cyclic loading of 20 nm palladium films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10315766" target="_blank" >RIV/00216208:11320/15:10315766 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1016/j.jallcom.2014.12.085" target="_blank" >http://dx.doi.org/10.1016/j.jallcom.2014.12.085</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.jallcom.2014.12.085" target="_blank" >10.1016/j.jallcom.2014.12.085</a>

Result language

angličtina

Original language name

Stress release during cyclic loading of 20 nm palladium films

Original language description

Gas phase loading of nanocrystalline and epitaxial 20 nm Pd films deposited on single crystalline sapphire substrates was studied in this work. The nanocrystalline film was deposited at room temperature and the epitaxial film deposited at 800 degrees C.The nanocrystalline film suffers from in-plane compressive stress imposed by atomic peening processes. The epitaxial film exhibits tensile stress caused by the different thermal expansion coefficients of Pd and sapphire substrate. Coherent phase transition into the hydride phase was observed both for the nanocrystalline and for the epitaxial film. For both films, the lattice parameters continuously increase during the phase transition to the hydride phase. Both films exhibit enhanced hydride formation pressure compared to bulk Pd. Misfit dislocations are formed at interface between Pd film and substrate during hydrogenation. This leads to irreversible change of stress state of the films subjected to sorption and desorption cycle with hy

Czech name

—

Czech description

—

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

—

Project

<a href="/en/project/GBP108%2F12%2FG043" target="_blank" >GBP108/12/G043: Interface controlled properties of micro/nanocrystalline materials for advanced structural applications, biodegradable implants and hydrogen storage</a><br>

Continuities

S - Specificky vyzkum na vysokych skolach

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Alloys and Compounds

ISSN

0925-8388

e-ISSN

—

Volume of the periodical

645

Issue of the periodical within the volume

Supplement 1

Country of publishing house

CH - SWITZERLAND

Number of pages

4

Pages from-to

"S450"-"S453"

UT code for WoS article

000360404100101

EID of the result in the Scopus database

2-s2.0-84938992904