Deposition of Iron Oxide Films by Plasma Jet Sputtering System for Dye-sensitized Solar Cell

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F17%3A10372260" target="_blank" >RIV/00216208:11320/17:10372260 - isvavai.cz</a>
Result on the web
<a href="https://www.mff.cuni.cz/veda/konference/wds/proc/pdf17/WDS17_11_f2_Tuharin.pdf" target="_blank" >https://www.mff.cuni.cz/veda/konference/wds/proc/pdf17/WDS17_11_f2_Tuharin.pdf</a>
DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Deposition of Iron Oxide Films by Plasma Jet Sputtering System for Dye-sensitized Solar Cell
Original language description
The dye-sensitized solar cell (DSSC) history and perspectives is reviewed. Band gap designs of various semiconductor films from iron oxide to iron pyrite are discussed. The hollow cathode plasma jet (HCPJ) sputtering technique at both DC and high power DC pulsed regimes is described with respect to iron oxide film deposition. The first results of measuring films by atomic force microscopy (AFM), scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDX) are presented.
Czech name
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Czech description
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Project
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Continuities
S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
WDS'17 Proceedings of Contributed Papers — Physics
ISBN
978-80-7378-356-3
ISSN
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e-ISSN
neuvedeno
Number of pages
6
Pages from-to
76-81
Publisher name
Matfyzpress
Place of publication
Praha
Event location
Prague, Czech Republic
Event date
Jun 6, 2017
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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