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Absence of free carriers in silicon nanocrystals grown from phosphorus- and boron-doped silicon-rich oxide and oxynitride

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F18%3A10384468" target="_blank" >RIV/00216208:11320/18:10384468 - isvavai.cz</a>

  • Result on the web

    <a href="https://doi.org/10.3762/bjnano.9.141" target="_blank" >https://doi.org/10.3762/bjnano.9.141</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.3762/bjnano.9.141" target="_blank" >10.3762/bjnano.9.141</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Absence of free carriers in silicon nanocrystals grown from phosphorus- and boron-doped silicon-rich oxide and oxynitride

  • Original language description

    Phosphorus- and boron-doped silicon nanocrystals (Si NCs) embedded in silicon oxide matrix can be fabricated by plasma-enhanced chemical vapour deposition (PECVD). Conventionally, SiH4 and N2O are used as precursor gasses, which inevitably leads to the incorporation of approximate to 10 atom % nitrogen, rendering the matrix a silicon oxynitride. Alternatively, SiH4 and O-2 can be used, which allows for completely N-free silicon oxide. In this work, we investigate the properties of B- and P-incorporating Si NCs embedded in pure silicon oxide compared to silicon oxynitride by atom probe tomography (APT), low-temperature photoluminescence (PL), transient transmission (TT), and current-voltage (I-V) measurements. The results clearly show that no free carriers, neither from P- nor from B-doping, exist in the Si NCs, although in some configurations charge carriers can be generated by electric field ionization. The absence of free carriers in Si NCs &lt;= 5 nm in diameter despite the presence of P- or B-atoms has severe implications for future applications of conventional impurity doping of Si in sub-10 nm technology nodes.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10306 - Optics (including laser optics and quantum optics)

Result continuities

  • Project

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2018

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Beilstein Journal of Nanotechnology

  • ISSN

    2190-4286

  • e-ISSN

  • Volume of the periodical

    9

  • Issue of the periodical within the volume

    18 May 2018

  • Country of publishing house

    DE - GERMANY

  • Number of pages

    11

  • Pages from-to

    1501-1511

  • UT code for WoS article

    000432849100002

  • EID of the result in the Scopus database

    2-s2.0-85047534671