Absence of free carriers in silicon nanocrystals grown from phosphorus- and boron-doped silicon-rich oxide and oxynitride
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F18%3A10384468" target="_blank" >RIV/00216208:11320/18:10384468 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.3762/bjnano.9.141" target="_blank" >https://doi.org/10.3762/bjnano.9.141</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.3762/bjnano.9.141" target="_blank" >10.3762/bjnano.9.141</a>
Alternative languages
Result language
angličtina
Original language name
Absence of free carriers in silicon nanocrystals grown from phosphorus- and boron-doped silicon-rich oxide and oxynitride
Original language description
Phosphorus- and boron-doped silicon nanocrystals (Si NCs) embedded in silicon oxide matrix can be fabricated by plasma-enhanced chemical vapour deposition (PECVD). Conventionally, SiH4 and N2O are used as precursor gasses, which inevitably leads to the incorporation of approximate to 10 atom % nitrogen, rendering the matrix a silicon oxynitride. Alternatively, SiH4 and O-2 can be used, which allows for completely N-free silicon oxide. In this work, we investigate the properties of B- and P-incorporating Si NCs embedded in pure silicon oxide compared to silicon oxynitride by atom probe tomography (APT), low-temperature photoluminescence (PL), transient transmission (TT), and current-voltage (I-V) measurements. The results clearly show that no free carriers, neither from P- nor from B-doping, exist in the Si NCs, although in some configurations charge carriers can be generated by electric field ionization. The absence of free carriers in Si NCs <= 5 nm in diameter despite the presence of P- or B-atoms has severe implications for future applications of conventional impurity doping of Si in sub-10 nm technology nodes.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10306 - Optics (including laser optics and quantum optics)
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Beilstein Journal of Nanotechnology
ISSN
2190-4286
e-ISSN
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Volume of the periodical
9
Issue of the periodical within the volume
18 May 2018
Country of publishing house
DE - GERMANY
Number of pages
11
Pages from-to
1501-1511
UT code for WoS article
000432849100002
EID of the result in the Scopus database
2-s2.0-85047534671