Effect of magnetic field on the formation of Cu nanoparticles during magnetron sputtering in the gas aggregation cluster source
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F19%3A10405899" target="_blank" >RIV/00216208:11320/19:10405899 - isvavai.cz</a>
Result on the web
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=VApIJhQKdX" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=VApIJhQKdX</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/ppap.201900133" target="_blank" >10.1002/ppap.201900133</a>
Alternative languages
Result language
angličtina
Original language name
Effect of magnetic field on the formation of Cu nanoparticles during magnetron sputtering in the gas aggregation cluster source
Original language description
Reliable production of nanoparticles (NPs) by magnetron sputtering in a gas aggregation source (GAS) is of great interest because of many potential applications. The size, shape, or structure of NPs can be tuned by the operational parameters of the GAS. In this study, fabrication of copper (Cu) NPs is investigated dependent on the magnetron magnetic field (MF)-a not much studied parameter. Decrease of the MF from 83 to 35 mT results in changes in the shape and size distribution of the NPs. MF also strongly affects the NPs deposition rate (DR). Electromagnetic trapping of the NPs in the vicinity of the magnetron target is proposed to be responsible for the changes in DR and polydispersity. The highest DR was reached at 45 mT.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Processes and Polymers
ISSN
1612-8850
e-ISSN
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Volume of the periodical
16
Issue of the periodical within the volume
11
Country of publishing house
DE - GERMANY
Number of pages
10
Pages from-to
1900133
UT code for WoS article
000481228900001
EID of the result in the Scopus database
2-s2.0-85070671408