Magnesium-silver cathodes for efficient charge injection into Organic Light Emitting Diodes deposited by LTVA method

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F21%3A10439706" target="_blank" >RIV/00216208:11320/21:10439706 - isvavai.cz</a>
Result on the web
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=~EERG~H0b7" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=~EERG~H0b7</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.jallcom.2021.159364" target="_blank" >10.1016/j.jallcom.2021.159364</a>

Result language
angličtina
Original language name
Magnesium-silver cathodes for efficient charge injection into Organic Light Emitting Diodes deposited by LTVA method
Original language description
The Laser-induced Thermionic Vacuum Arc method was applied to optimize magnesium-silver (Mg:Ag) alloys, which can be potentially used as stable metallic cathodes for optoelectronic devices. Besides lowering the cathode work function given by the magnesium that improves the electron injection, Mg:Ag alloys induce a higher electrical conductivity, estimated here to be 3.42 x 10(7) S m(-1) for AgMg3, compared with 2.64 x 10(7) S m(-1), estimated here for Mg thin films. Mg:Ag alloys avoid the critical issue of Mg oxidation for better charge injection in optoelectronic active layers. By improving the Thermionic Vacuum Arc technique with the laser beam, this method enables the control of the silver concentration in these alloys due to photonic processes. The uniformity of metallic thin films, compactness, and high purity are the primary advantages of the Laser-induced Thermionic Vacuum Arc method. (C) 2021 Elsevier B.V. All rights reserved.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)

Project
<a href="/en/project/GA19-00579S" target="_blank" >GA19-00579S: Advanced diagnostics of reactive HiPIMS plasma for deposition of oxide, nitride and sulfide layers</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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