Magnesium plasma diagnostics by heated probe and characterization of the Mg thin films deposited by thermionic vacuum arc technology

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319537" target="_blank" >RIV/00216208:11320/15:10319537 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1088/0963-0252/24/3/035008" target="_blank" >http://dx.doi.org/10.1088/0963-0252/24/3/035008</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0963-0252/24/3/035008" target="_blank" >10.1088/0963-0252/24/3/035008</a>

Result language

angličtina

Original language name

Magnesium plasma diagnostics by heated probe and characterization of the Mg thin films deposited by thermionic vacuum arc technology

Original language description

The aim of this paper is to report on magnesium plasma diagnostics and to investigate the properties of thin Mg films deposited on Si and glass substrates by using thermionic vacuum arc (TVA) technology. TVA is an original deposition method using a combination of anodic arc and powerful electron gun system (up to 600 W) for the growth of thin films from solid precursors under a vacuum of 10(-6)Torr. Due to the comparatively high deposition rate as well as comparatively high plasma potential-around 0.5 kV-plasma diagnostics were carried out by a heated probe that prevents layer deposition on the probe surface. The estimated value of electron density was in the order of 1.0 x 10(16)m(-3) and the electron temperature varied between 4 x 10(4) and 1.2 x 10(5) K (corresponding to two different discharge conditions). The thin Mg films were investigated using SEM images and TEM analyses provided with HR-TEM and SAED facilities. According to the SAED patterns the structure of the films can be i

Czech name

—

Czech description

—

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

—

Project

<a href="/en/project/GA15-00863S" target="_blank" >GA15-00863S: A study of impulse plasmatic systems for deposition of thin layers with applications in photonics</a><br>

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

—

Volume of the periodical

24

Issue of the periodical within the volume

3

Country of publishing house

GB - UNITED KINGDOM

Number of pages

9

Pages from-to

—

UT code for WoS article

000356857800033

EID of the result in the Scopus database

2-s2.0-84937574984