Plasma diagnostics and characterization of the Mg and Mg-Zn thin films deposited by thermionic vacuum arc (TVA) method
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F19%3A10405885" target="_blank" >RIV/00216208:11320/19:10405885 - isvavai.cz</a>
Result on the web
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=C4ruW0F45f" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=C4ruW0F45f</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2019.06.002" target="_blank" >10.1016/j.vacuum.2019.06.002</a>
Alternative languages
Result language
angličtina
Original language name
Plasma diagnostics and characterization of the Mg and Mg-Zn thin films deposited by thermionic vacuum arc (TVA) method
Original language description
The Thermionic Vacuum Arc (TVA) is an original deposition method using a combination of anodic arc and powerful electron gun system (up to 600 W) for the growth of thin films from solid precursors under a vacuum of 10(-4) Pa. The advantage of this technology is the comparatively high deposition rate while keeping good properties of the deposited films. The aim of this paper is to report on the characterization of the Mg and Mg-Zn thin films deposited by the TVA method. By careful selection of the deposition parameters, we have achieved a rather stable discharge that resulted in good film properties. The surface morphology and wettability of the deposited Mg and Mg-Zn thin films were investigated using transmission electron microscopy (TEM), scanning electron microscopy (SEM) and free surface energy (FSE) by surface energy evaluation system. The results revealed that the size of crystallites is 5.0 nm in the case of Mg-Zn/Si and 6.5 nm in the case of Mg/Si sample; a promising result for future applications of the TVA. The film properties are complemented by plasma parameters measured by a heated probe.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
<a href="/en/project/GA19-00579S" target="_blank" >GA19-00579S: Advanced diagnostics of reactive HiPIMS plasma for deposition of oxide, nitride and sulfide layers</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Vacuum
ISSN
0042-207X
e-ISSN
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Volume of the periodical
167
Issue of the periodical within the volume
Sep
Country of publishing house
GB - UNITED KINGDOM
Number of pages
7
Pages from-to
129-135
UT code for WoS article
000482245800020
EID of the result in the Scopus database
2-s2.0-85066946773