Wet etching of gold on graphene for high-quality resist-free graphene surfaces
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F23%3A10473171" target="_blank" >RIV/00216208:11320/23:10473171 - isvavai.cz</a>
Result on the web
<a href="https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=R1T9EXNRzs" target="_blank" >https://verso.is.cuni.cz/pub/verso.fpl?fname=obd_publikace_handle&handle=R1T9EXNRzs</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/2632-959X/acef45" target="_blank" >10.1088/2632-959X/acef45</a>
Alternative languages
Result language
angličtina
Original language name
Wet etching of gold on graphene for high-quality resist-free graphene surfaces
Original language description
Wet etching of gold on graphene is challenging due to the weak adhesion of the resist mask to graphene. We report an operating procedure for alkali ion-free wet etching of gold on graphene using a mixture of hydrochloric and nitric acids (aqua regia) with a high lateral resolution down to 100 nm. We investigate the role of positive and negative resists, electron beam lithography (EBL) dose, hard-bake, oxygen etching, aging, and sensitivity to the etch parameters, such as the freshness of dilute aqua regia, etch time, and the order of etched samples. The negative-tone resist provides the best results. The over-dosed EBL exposure can enhance the resist adhesion, as hard-bake below the glass-transition temperature and well-defined wet etch of the resist-residua-free gold surface. We also present a cleaning procedure to avoid bubble formation after the hard bake. Our results demonstrate that wet etching of gold on graphene using aqua regia is a viable method for achieving high-quality resist-free graphene surfaces. This method has potential applications in graphene nanoelectronics and nanophotonics, where high-quality graphene surfaces are essential for device performance.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
<a href="/en/project/GC21-28470J" target="_blank" >GC21-28470J: Ultra-fast rectifiers for time-resolved terahertz spectroscopy</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Nano Express
ISSN
2632-959X
e-ISSN
2632-959X
Volume of the periodical
4
Issue of the periodical within the volume
3
Country of publishing house
GB - UNITED KINGDOM
Number of pages
9
Pages from-to
035006
UT code for WoS article
001057452200001
EID of the result in the Scopus database
2-s2.0-85169977970