Plasmachemical Deposition of Thin Films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F00%3A00002470" target="_blank" >RIV/00216224:14310/00:00002470 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Plasmachemical Deposition of Thin Films
Original language description
PECVD deposition of thin films in RF and MW plasma. Hard diamond-like carbon thin films. Transparent SiOx thin films. Polycrystalline diamond.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2000
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
4th Czech-Russian Seminar on Electrophysical and Thermophysical Processes in Low-Temperature Plasma
ISBN
80-214-1600-9
ISSN
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e-ISSN
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Number of pages
10
Pages from-to
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Publisher name
VUT Brno
Place of publication
Brno
Event location
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Event date
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Type of event by nationality
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UT code for WoS article
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