Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F00%3A00003103" target="_blank" >RIV/00216224:14310/00:00003103 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films
Original language description
Deposition of diamond like films with an incorporation of silicon by plasma enhanced CVD technique from mixture of methane, argon and hexamethyldisiloxane (HMDSO). Study of the influence of the percentage of HMDSO in the mixture on film properties.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/VS96084" target="_blank" >VS96084: Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2000
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Abstracts of Invited Lecturers and Contributed Papers ,XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases
ISBN
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ISSN
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e-ISSN
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Number of pages
2
Pages from-to
408
Publisher name
European Physical Society
Place of publication
Miskolc - Lillafüred, Hungary
Event location
Miskolc - Lillafüred, Hungary
Event date
Jan 1, 2000
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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