Study of Thin Film Defects by Atomic Force Microscopy

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F01%3A00008554" target="_blank" >RIV/00216224:14310/01:00008554 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Study of Thin Film Defects by Atomic Force Microscopy
Original language description
In the contribution results concerning the study of some defects of thin films will be presented. It is shown that surface defects of the upper boundaries of the films such as microroughness, microobjects and facates can be studied quantitatively. Concrete results are presented for the upper boundaries of the films formed by the following materials: HfO2, ZnSe and ZnTe. As for microroughness the values of the basic statistical quantities, i.e. the rms values of the hights, the values of the autocorrelation length and the values of the power spectral density function are presented for the film mentioned. Further, the misrepresentation concernings the results of the AFM measurements of the upper boundaries of the columnar thin films is briefly discussed.
Czech name
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Czech description
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Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of the 4th Seminar on Quantitative Microscopy and 1st Seminar on Nanoscale Calibration Standards and Methods
ISBN
3-89701-840-3
ISSN
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e-ISSN
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Number of pages
11
Pages from-to
107-117
Publisher name
Physikalisch-Technische Bundesanstalt
Place of publication
Braunschweig
Event location
November 15-16, 2001, Bergisch Gladbach - German
Event date
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Type of event by nationality
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UT code for WoS article
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