Study of Argon Plasma Treatment of Polycarbonate Substrate

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F03%3A00021240" target="_blank" >RIV/00216224:14310/03:00021240 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Study of Argon Plasma Treatment of Polycarbonate Substrate

Original language description

Results of polycarbonate plasma treatment in argon r.f. glow discharges as concern the chem- ical structure and surface free energy are presented. The oxygen-to-carbon ratio increased after the treatment indicating an increase of oxygen containing functional groups on the polycarbonate surface. Small amount of silicon as a result of previous depositions of organosilicon thin films in the same reactor and small amount of nitrogen coming probably from an exposure of the reactive surface to the atmospherewere found on the surface. The surface free energy increased after the treatment from the original value of 35 mJ/m2 to 63-74 mJ/m2. Effect of treatment time, gas flow rate, pressure and aging on the surface free energy was studied too. In order to studyan improvement of adhesion between the polycarbonate and an additional coatings the organosilicon thin films were deposited on the untreated and plasma treated polycarbonate. The interfacial fracture resistance of such a system was quali

Czech name

Studium ošetření povrchu polykarbonátu v argonovém plazmatu

Czech description

Studium ošetření povrchu polykarbonátu v argonovém plazmatu

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/ME%20489" target="_blank" >ME 489: Study of reactivity of organosilicon monomers in plasma environment</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2003

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Acta physica slovaca

ISSN

0323-0465

e-ISSN

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Volume of the periodical

53

Issue of the periodical within the volume

6

Country of publishing house

SK - SLOVAKIA

Number of pages

16

Pages from-to

489-504

UT code for WoS article

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EID of the result in the Scopus database

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