Surface free energy of silicon-based plasma polymer films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F09%3APU84425" target="_blank" >RIV/00216305:26310/09:PU84425 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Surface free energy of silicon-based plasma polymer films
Original language description
Silicon-based plasma polymer films were deposited on planar glass substrates from vinyltriethoxysilane monomer and tetravinylsilane in a mixture with oxygen gas employing RF (13.56 MHz) pulsed plasma. The wettability of the deposited films was investigated by the sessile drop method, and the surface free energy and its components were evaluated using the Owens-Wendt-Kaelble geometric mean method, the Wu harmonic mean method, and van Oss, Chaudhury, and Good acid-base theory. The surface free energy ranging from 33 to 45 mJ m-2 may be controlled by the effective power in the case of plasma-polymerized films of vinyltriethoxysilane. An improved wettability was obtained for plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas,where the surface free energy was in the range 41 - 58 mJ m-2 and may be controlled by the power and the amount of oxygen in the mixture. Chemical analyses of the films showed a rough correlation between the surface free energy and chemic
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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