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Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F12%3APU102050" target="_blank" >RIV/00216305:26310/12:PU102050 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys

  • Original language description

    Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05?40 W). The deposited materials in the formof hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.

  • Czech name

  • Czech description

Classification

  • Type

    O - Miscellaneous

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2012

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů