Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F12%3APU102050" target="_blank" >RIV/00216305:26310/12:PU102050 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys
Original language description
Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05?40 W). The deposited materials in the formof hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů