Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F03%3APU38246" target="_blank" >RIV/00216305:26310/03:PU38246 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

Original language description

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and ?×-metacryloxyprophyltrimethoxysilane.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2003

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Proceedings of ISPC XVI

ISBN

NEUVEDENO

ISSN

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e-ISSN

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Number of pages

6

Pages from-to

1-6

Publisher name

IUPAC

Place of publication

Taormina

Event location

Taormina

Event date

Jun 21, 2003

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

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