Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F03%3APU38274" target="_blank" >RIV/00216305:26310/03:PU38274 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—
Alternative languages
Result language
angličtina
Original language name
Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films
Original language description
The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.
Czech name
—
Czech description
—
Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
—
Result continuities
Project
—
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003
ISBN
80-86732-18-5
ISSN
—
e-ISSN
—
Number of pages
5
Pages from-to
441-445
Publisher name
MATFYZPRESS
Place of publication
Praha
Event location
Praha
Event date
Jun 10, 2003
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
—