Pulsed dc magnetron discharge for high-rate sputtering of this films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F01%3A00064883" target="_blank" >RIV/49777513:23520/01:00064883 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Pulsed dc magnetron discharge for high-rate sputtering of this films
Original language description
This article analyzes a pulsed magnetron discharge. Main attention is devoted to the specific behaviour of the pulsed discharge. The time development of pulsed discharge is composed of three regimes of operation: (1) plasma buildup, (2) stationary plasma, and (3) decaying plasma when the pulse power is off. The duration of individual regimes strongly depends on the pulse length t1, the repetition frequency fr of pulses, the power delivered into the discharge, and the operating pressure. The proportion of duration of the regime of plasma buildup to the regime of stationary plasma in the pulse dramatically influences the I-V characteristics of the pulsed discharge and the deposition rate of sputtered films. The I-V characteristics of an unbalanced roundplanar magnetron with a Cu target 100 mm in diameter are shown. The deposition rate of Cu films sputtered with the pulsed magnetron is also given.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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