Plasma and floating potentials in magnetron discharges

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43932284" target="_blank" >RIV/49777513:23520/17:43932284 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1116/1.4992054" target="_blank" >http://dx.doi.org/10.1116/1.4992054</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/1.4992054" target="_blank" >10.1116/1.4992054</a>

Result language
angličtina
Original language name
Plasma and floating potentials in magnetron discharges
Original language description
This letter reports on great differences in values of the plasma Up and floating Ufl potentials in sputtering discharges generated by single and dual magnetrons. It is shown that (i) the differences in Up and Ufl result in strongly different properties of films sputtered by single and dual magnetrons at the same power delivered to the magnetron discharge, (ii) in the direct current single and dual magnetron discharges, the values of Up and Ufl strongly depend on the electric conductivity of the surface of the grounded deposition chamber, and (iii) a pulsed dual magnetron with a closed magnetic field B is the only one sputtering system, which enables us to sputter the films with fully reproducible properties.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
20506 - Coating and films

Project
<a href="/en/project/LO1506" target="_blank" >LO1506: Sustainability support of the centre NTIS - New Technologies for the Information Society</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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