Reduction of transient regime in fast preionized high power pulsed magnetron discharge

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F05%3A00012968" target="_blank" >RIV/00216224:14310/05:00012968 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Reduction of transient regime in fast preionized high power pulsed magnetron discharge
Original language description
A high-power pulsed-magnetron discharge (several kW/cm2)is described. It operates at pulse duration of the order of few ľs, signicantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He buer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few ľs which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to 10A/cm2 induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion ux to the substrate. Preliminary result on Cu deposit in trenches is reported.
Czech name
Omezení pechodového režimu pi pulzním magnetronovém naprašování
Czech description
Prezentace stabilního pulzního magnetronového výboje. Pro stabilizicaci depoziního procesu byla použita preionizace.

Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/GD202%2F03%2FH162" target="_blank" >GD202/03/H162: Advanced topics in physics and chemistry of plasmas</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2005
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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