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Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F10%3A00503522" target="_blank" >RIV/49777513:23520/10:00503522 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium

  • Original language description

    High power impulse magnetron sputtering of zirconium was investigated at the average target power density of up to 2.22 kW/cm2 in a pulse. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter at the argon pressure of 1 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 4% to 10%. Time-averaged mass spectroscopy was carried out at the substrate positions of 100 and 200 mm from the target. The increase in the average targetpower density from 0.97 kW/cm2 to 2.22 kW/cm2 in shortened voltage pulses (from 200 to 80 microseconds) at an average target power density of 100 W/cm2 in a period led to high fractions (21%-32%) of doubly charged zirconium ions in total ion fluxes ontothe substrate located 100 mm from the target. However, the respective fractions of singly charged zirconium ions decreased from 23% to 3%. It was observed that ion energy distributions were extended to high energies (up to 100 eV relativ

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Journal of Applied Physics

  • ISSN

    0021-8979

  • e-ISSN

  • Volume of the periodical

    108

  • Issue of the periodical within the volume

    6

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    9

  • Pages from-to

  • UT code for WoS article

    000282646400017

  • EID of the result in the Scopus database