Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F10%3A00503522" target="_blank" >RIV/49777513:23520/10:00503522 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium
Original language description
High power impulse magnetron sputtering of zirconium was investigated at the average target power density of up to 2.22 kW/cm2 in a pulse. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter at the argon pressure of 1 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 4% to 10%. Time-averaged mass spectroscopy was carried out at the substrate positions of 100 and 200 mm from the target. The increase in the average targetpower density from 0.97 kW/cm2 to 2.22 kW/cm2 in shortened voltage pulses (from 200 to 80 microseconds) at an average target power density of 100 W/cm2 in a period led to high fractions (21%-32%) of doubly charged zirconium ions in total ion fluxes ontothe substrate located 100 mm from the target. However, the respective fractions of singly charged zirconium ions decreased from 23% to 3%. It was observed that ion energy distributions were extended to high energies (up to 100 eV relativ
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Applied Physics
ISSN
0021-8979
e-ISSN
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Volume of the periodical
108
Issue of the periodical within the volume
6
Country of publishing house
US - UNITED STATES
Number of pages
9
Pages from-to
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UT code for WoS article
000282646400017
EID of the result in the Scopus database
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