Ion flux characteristics in high-power pulsed magnetron sputtering discharges

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F07%3A00000061" target="_blank" >RIV/49777513:23520/07:00000061 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Ion flux characteristics in high-power pulsed magnetron sputtering discharges

Original language description

High-power pulsed dc magnetron discharges for ionized high-rate sputtering of copper films were investigated. The repetition frequency was 1kHz at a fixed 20% duty cycle and argon pressures of 0.5Pa and 5Pa. Time evolutions of the discharge characteristics were measured at a target power density in a pulse up to 950W/cm2. Time-averaged mass spectroscopy was performed at substrate positions. It was shown that copper ions are strongly dominant in total ion fluxes onto the substrate. Their energy distributions with a broadened low-energy part at a lower pressure are extended to higher energies (up to 45eV relative to ground potential for the target-to-substrate distance of 100mm).

Czech name

Charakterizace iontových toků ve vysokovýkonových pulzních magnetronových výbojích

Czech description

45eV vzhledem k potenciálu zem

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2007

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Europhysics Letters

ISSN

0295-5075

e-ISSN

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Volume of the periodical

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Issue of the periodical within the volume

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Country of publishing house

GB - UNITED KINGDOM

Number of pages

1

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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