A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F10%3A00503516" target="_blank" >RIV/49777513:23520/10:00503516 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering

Original language description

We present a phenomenological equilibrium model applicable to high-power pulsed dc magnetron sputtering with relatively long steady-state discharge regimes established during pulses. The model makes it possible to calculate the normalized rate coefficient (determining the deposition rate of films per target power density), and the ionized fraction of target material atoms in the flux onto the substrate, as functions of the magnetron voltage and the fraction of target material ions in the total ion fluxonto the target (being related to an applied target power density). We used this model to clarify the large differences between the corresponding deposition characteristics of copper and titanium measured by us during high-power pulsed dc magnetron sputtering of the two materials. We investigated the effects of higher losses of the target material ions to chamber walls and of reduced additional ionization in the plasma bulk in the magnetron system with a weaker magnetic confinement.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2010

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

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Volume of the periodical

19

Issue of the periodical within the volume

6

Country of publishing house

GB - UNITED KINGDOM

Number of pages

12

Pages from-to

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UT code for WoS article

000284689600010

EID of the result in the Scopus database

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