Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F13%3A43917963" target="_blank" >RIV/49777513:23520/13:43917963 - isvavai.cz</a>

Result on the web

<a href="http://iopscience.iop.org/0022-3727/46/10/105203" target="_blank" >http://iopscience.iop.org/0022-3727/46/10/105203</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0022-3727/46/10/105203" target="_blank" >10.1088/0022-3727/46/10/105203</a>

Result language

angličtina

Original language name

Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges

Original language description

We use a non-stationary two-zone model to verify predictions of a steady-state phenomenological model (Vlček and Burcalová) under the conditions in typical high-power impulse magnetron sputtering discharges. It is shown that the steady-state phenomenological model provides a reliable description of fundamental deposition parameters characterizing efficiency of magnetron sputtering and the transfer of target material ions to the substrate in these discharges with relatively long steady-state discharge regimes established during pulses. Based on the results, we recommend to lower the magnetic field strength in a magnetron system at a fixed average target power density in a pulse and thereby use a higher magnetron voltage in order to enhance the deposition rate and keep or even increase the ionized fraction of sputtered target material atoms in the flux onto the substrate.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GAP108%2F12%2F0393" target="_blank" >GAP108/12/0393: Hard nanocomposite coatings with enhanced toughness and unique properties</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2013

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Physics D: Applied Physics

ISSN

0022-3727

e-ISSN

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Volume of the periodical

46

Issue of the periodical within the volume

10

Country of publishing house

GB - UNITED KINGDOM

Number of pages

7

Pages from-to

1-7

UT code for WoS article

000315169500013

EID of the result in the Scopus database

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