Effect of the target power density on high power impulse magnetron sputtering of copper

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F12%3A43914807" target="_blank" >RIV/49777513:23520/12:43914807 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1088/0963-0252/21/2/025012" target="_blank" >http://dx.doi.org/10.1088/0963-0252/21/2/025012</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/0963-0252/21/2/025012" target="_blank" >10.1088/0963-0252/21/2/025012</a>

Result language
angličtina
Original language name
Effect of the target power density on high power impulse magnetron sputtering of copper
Original language description
We present a model analysis of a high power impulse magnetron sputtering of copper. We use a non-stationary global model based on the particle and energy conservation equations in two zones, which makes it possible to calculate time evolutions of the averaged process gas and target material neutral and ion densities, as well as the fluxes of these particles to the target and substrate during a pulse period. We study the effect of the increasing target power density under conditions corresponding to a real experimental system. The calculated target current waveforms show a long steady state and are in a good agreement with the experimental results. For an increasing target power density, an analysis of the particle densities shows a gradual transition to a metal dominated discharge plasma with an increasing degree of ionization of the depositing flux.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/OC10045" target="_blank" >OC10045: Novel plasma sources for film deposition and surface modification</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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