Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound target
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F23%3A43969596" target="_blank" >RIV/49777513:23520/23:43969596 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1116/6.0002944" target="_blank" >https://doi.org/10.1116/6.0002944</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/6.0002944" target="_blank" >10.1116/6.0002944</a>
Alternative languages
Result language
angličtina
Original language name
Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound target
Original language description
A combination of time-averaged mass spectroscopy (MS), time-averaged optical emission spectroscopy (OES), and plasma transport modeling was employed to understand the transport processes of ions and atoms in high-power impulse magnetron sputtering discharges resulting in changes in the stoichiometry of NbC films during their deposition from a stoichiometric NbC compound target at different repetition frequencies and duty cycles. Mass spectrometry showed that the fluxes of ions originating from the elements of the target increase with increasing pulse power density due to an increasing electron density and, thus, electron-impact ionization probability. Due to the higher ionization energy and much lower ionization cross section of C (compared to Nb), it was found that the contribution of C ions to the deposition flux is practically negligible. Additionally, OES tracked the densities of ions and atoms at different distances from the target. The OES analysis revealed that the atom densities decreased as the pulse power density increased. In contrast, the ion densities exhibited an increase, which is consistent with the findings of MS. Using the data from MS, OES, and modeling, we were able to estimate the fluxes of atoms to the substrate. Our observations demonstrated a transition from C-rich toward Nb-rich flux of film-forming species with increasing pulse power density, corresponding to changes in the film composition. We further discuss the role of internal plasma processes that are responsible for this transition.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Vacuum Science and Technology A
ISSN
0734-2101
e-ISSN
1520-8559
Volume of the periodical
41
Issue of the periodical within the volume
6
Country of publishing house
US - UNITED STATES
Number of pages
15
Pages from-to
1-15
UT code for WoS article
001094046900001
EID of the result in the Scopus database
2-s2.0-85175522607