Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F06%3A00016723" target="_blank" >RIV/00216224:14310/06:00016723 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization
Original language description
In this paper, we present the characterization of the tungsten thin films deposited by Thermo-ionic Vacuum Arc (TVA) method. Characterization of the obtained tungsten thin films has been made by Transmission Electron Microscope (TEM) with a magnificationof 1.4 M and a resolution of 1.4 angstrom. Other techniques were used as Grain Size Distribution, Selected Area Diffraction (SAED), Fast Fourier Transmission (FFT). The obtained films were characterized by nano-indentation and atomic force microscopy (AFM). The AFM measurements have proved the smoothness of the deposited films (however with some droplets) with peak to valley roughness in the range of 20-30 nm. As regards tribological results, the hardness of deposited films was measured by a Karl Zeissmicrohardner tester and the coefficient of friction was measured with an Amsler tribometer. The samples (graphite substrates 30 mm x 30 mm x 8 mm coated with W) were tested using depth sensing indentation tester Fischerscope H100 Xyp. We
Czech name
Charakterizace wolframových tenkých vrstev deponovaných termoionický vakuovým obloukem (TVA)
Czech description
Charakterizace wolframových tenkých vrstev deponovaných termoionický vakuovým obloukem (TVA)

Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Publication year
2006
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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