Analysis of the Transport of Ionized Titanium Atoms in a Highly Ionized Sputter Deposition Process
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F07%3A00022169" target="_blank" >RIV/00216224:14310/07:00022169 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Analysis of the Transport of Ionized Titanium Atoms in a Highly Ionized Sputter Deposition Process
Original language description
Analysis of the Transport of Ionized Titanium Atoms in a Highly Ionized Sputter Deposition Process
Czech name
Studium transportu ionizovaných částic v pulzním IPVD procesu
Czech description
Studium transportu ionizovaných částic v pulzním IPVD procesu
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2007
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Processes and Polymers
ISSN
1612-8850
e-ISSN
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Volume of the periodical
4/2007
Issue of the periodical within the volume
S1
Country of publishing house
US - UNITED STATES
Number of pages
5
Pages from-to
"S424"-"S429"
UT code for WoS article
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EID of the result in the Scopus database
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