Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F09%3A00029370" target="_blank" >RIV/00216224:14310/09:00029370 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics
Original language description
Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics, proceeding
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GP202%2F08%2FP038" target="_blank" >GP202/08/P038: Study of hybrid deposition process and its application for thin film deposition</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8
ISBN
978-80-214-3875-0
ISSN
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e-ISSN
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Number of pages
1
Pages from-to
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Publisher name
Brno University of Technology
Place of publication
Brno
Event location
Blansko
Event date
Apr 19, 2009
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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