Suppressed hysteresis behaviour of titanium sputtering in acetylene gas.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F09%3A00049603" target="_blank" >RIV/00216224:14310/09:00049603 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Suppressed hysteresis behaviour of titanium sputtering in acetylene gas.
Original language description
This contribution deals with suppressed hysteresis behaviour of titanium sputtering in argon and acetylene mixture.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GP202%2F08%2FP038" target="_blank" >GP202/08/P038: Study of hybrid deposition process and its application for thin film deposition</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů