Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F10%3A00044824" target="_blank" >RIV/00216224:14310/10:00044824 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages
Original language description
A promising method for monitoring of reactive magnetron sputtering, based on the measurement of amplitudes of higher harmonic frequencies of discharge voltages, is proposed. The measurement of the amplitudes can be performed either by an uncompensated probe in the plasma or on the cable between the RF generator and the sputtered target. The sensitivity of the proposed method is significantly better than measurement of other electrical quantities conventionally used for process control. Physical reasonsfor the change of amplitudes of higher harmonic frequencies during the mode transition were found. The paper shows that the observed changes in amplitudes of higher harmonics by the transition are not caused either by the pressure change, or by the changes in the composition of the gas in the reactor volume. It was found that the amplitudes of higher harmonics reflect primarily the state of the magnetron target poisoning.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GP202%2F08%2FP038" target="_blank" >GP202/08/P038: Study of hybrid deposition process and its application for thin film deposition</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Sources Sci. Technol.
ISSN
0963-0252
e-ISSN
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Volume of the periodical
19
Issue of the periodical within the volume
5
Country of publishing house
GB - UNITED KINGDOM
Number of pages
8
Pages from-to
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UT code for WoS article
000282096600016
EID of the result in the Scopus database
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