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Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F10%3A00044824" target="_blank" >RIV/00216224:14310/10:00044824 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages

  • Original language description

    A promising method for monitoring of reactive magnetron sputtering, based on the measurement of amplitudes of higher harmonic frequencies of discharge voltages, is proposed. The measurement of the amplitudes can be performed either by an uncompensated probe in the plasma or on the cable between the RF generator and the sputtered target. The sensitivity of the proposed method is significantly better than measurement of other electrical quantities conventionally used for process control. Physical reasonsfor the change of amplitudes of higher harmonic frequencies during the mode transition were found. The paper shows that the observed changes in amplitudes of higher harmonics by the transition are not caused either by the pressure change, or by the changes in the composition of the gas in the reactor volume. It was found that the amplitudes of higher harmonics reflect primarily the state of the magnetron target poisoning.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GP202%2F08%2FP038" target="_blank" >GP202/08/P038: Study of hybrid deposition process and its application for thin film deposition</a><br>

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Plasma Sources Sci. Technol.

  • ISSN

    0963-0252

  • e-ISSN

  • Volume of the periodical

    19

  • Issue of the periodical within the volume

    5

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    8

  • Pages from-to

  • UT code for WoS article

    000282096600016

  • EID of the result in the Scopus database