Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F09%3A00029226" target="_blank" >RIV/00216224:14310/09:00029226 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process

Original language description

The reactive magnetron sputtering deposition process controlled by the flow of the reactive gas exhibits processing stability problems. Since the optimal experimental conditions lie very close to the abrupt transition from the metallic to the compound mode, the range at which the films with the right stoichiometry are deposited at high deposition rates is strongly limited and permanent process monitoring is necessary. A sensitive method for the process monitoring is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages during the radio-frequency sputtering deposition process. The voltage waveform recorded by the uncompensated probe placed in the vicinity of the plasma contains muchhigher relative proportion of higher harmonics than the waveform measured on the cathode. Some of the harmonics are extremely sensitive markers of the transition between the two regimes of interest.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GP202%2F08%2FP038" target="_blank" >GP202/08/P038: Study of hybrid deposition process and its application for thin film deposition</a><br>

Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Europhysics Letters

ISSN

0295-5075

e-ISSN

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Volume of the periodical

85

Issue of the periodical within the volume

1

Country of publishing house

FR - FRANCE

Number of pages

5

Pages from-to

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UT code for WoS article

000263692500019

EID of the result in the Scopus database

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