Plasma treatment of silicon surface by DCSBD

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F11%3A00049476" target="_blank" >RIV/00216224:14310/11:00049476 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Plasma treatment of silicon surface by DCSBD

Original language description

This paper focuses on the plasma treatment of crystalline Si (100) surface. The plasma was generated by Diffuse Coplanar Surface Barrier Discharge (DCSBD) at atmospheric pressure using ambient atmosphere. Surface free energy of silicon was investigated by contact angle measurement and surface morphology was studied by Atomic force microscope. Plasma treatment increases the surface wettability and AFM measurements showed that the plasma influences also the surface roughness.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/KAN101630651" target="_blank" >KAN101630651: Preparation of nano-films and nano-coatings on textiles using plasma surface treatment at atmospheric pressure</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2011

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Acta Technica CSAV

ISSN

0001-7043

e-ISSN

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Volume of the periodical

Volume 56

Issue of the periodical within the volume

2011

Country of publishing house

CZ - CZECH REPUBLIC

Number of pages

6

Pages from-to

356-361

UT code for WoS article

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EID of the result in the Scopus database

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