Multilayered films based on DLC, DLC:N and SiOx grown by PECVD on stainless steel

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F11%3A00050060" target="_blank" >RIV/00216224:14310/11:00050060 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Multilayered films based on DLC, DLC:N and SiOx grown by PECVD on stainless steel
Original language description
Diamond-like carbon films (DLC) exhibit useful properties such as high hardness, low friction coefficient, high thermal conductivity and wide band gaps. However, due to an inherent internal stress and bad adhesion to stainless steel their use in industrial applications is limited. A better adhesion can be achieved by adding different dopants into a DLC matrix, especially for metallic substrates. Also, silicon based interlayers was used In order to promote the adhesion. Hydrogenated DLC films using different mixtures were prepared by plasma enhanced chemical vapor deposition (PECVD) using capacitively coupled rf discharge at 13.56 MHz. Optical and mechanical methods were used to to determine functional properties. The hardness and Young's modulus of multilayered films were between 14 GPa and 80 GPa, respectively. For adhesion, the critical load Lc2 ranged from 2.1 N in the case of nitrogen containing DLC, to 11.8 N for multilayered film based on SiOx.
Czech name
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Czech description
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Project
<a href="/en/project/GD104%2F09%2FH080" target="_blank" >GD104/09/H080: Plasmachemical processes and their technological applications</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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