Effect of ultraviolet curing wavelength on low-k dielectric material properties and plasma damage resistance

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F11%3A00052302" target="_blank" >RIV/00216224:14310/11:00052302 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1016/j.tsf.2011.01.339" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2011.01.339</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2011.01.339" target="_blank" >10.1016/j.tsf.2011.01.339</a>

Result language

angličtina

Original language name

Effect of ultraviolet curing wavelength on low-k dielectric material properties and plasma damage resistance

Original language description

A set of SiCOH low dielectric constant films (low-k) has been deposited by plasma enhanced chemical vapor deposition using variable flow rates of the porogen (sacrificial phase) and matrix precursors. During the deposition, two different substrate temperatures and radio frequency power settings were applied. Next, the deposited films were cured by the UV assisted annealing (UV-cure) using two industrial UV light sources: a monochromatic UV source with intensity maximum at gimel = 172 nm (lamp A) and a broadband UV source with intensity spectrum distributed below 200 nm (lamp B). This set of various low-k films has been additionally exposed to NH3 plasma (used for the CuOx reduction during Cu/low-k integration) in order to evaluate the effect of the film preparation conditions on the plasma damage resistance of low-k material.

Czech name

—

Czech description

—

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

—

Project

—

Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2011

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Volume of the periodical

519

Issue of the periodical within the volume

11

Country of publishing house

GB - UNITED KINGDOM

Number of pages

8

Pages from-to

3619-3626

UT code for WoS article

000289333400030

EID of the result in the Scopus database

—