Optical characterization of HfO2 thin films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F11%3A00055011" target="_blank" >RIV/00216224:14310/11:00055011 - isvavai.cz</a>
Alternative codes found
RIV/68081731:_____/11:00365941 RIV/60162694:G43__/11:00449520
Result on the web
<a href="http://www.sciencedirect.com/science/article/pii/S0040609011007863" target="_blank" >http://www.sciencedirect.com/science/article/pii/S0040609011007863</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.tsf.2011.03.128" target="_blank" >10.1016/j.tsf.2011.03.128</a>

Result language
angličtina
Original language name
Optical characterization of HfO2 thin films
Original language description
Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the filmoptical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail.
Czech name
—
Czech description
—

Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
—

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Similar results(10)